BEAT FREQUENCY AND VELOCITY VARIATION OF IONS IN A MAGNETIZED PLASMA SHEATH FOR DIFFERENT OBLIQUENESS OF THE MAGNETIC FIELD

Authors

  • B. R. Adhikari Central Department of Physics, Tribhuvan University, Kirtipur, Kathmandu
  • S. Basnet Central Department of Physics, Tribhuvan University, Kirtipur, Kathmandu
  • H. P. Lamichhane Central Department of Physics, Tribhuvan University, Kirtipur, Kathmandu
  • R. Khanal Central Department of Physics, Tribhuvan University, Kirtipur, Kathmandu

DOI:

https://doi.org/10.3126/jist.v23i1.22201

Keywords:

Plasma, Magnetized sheath, Bohm-Chodura condition, Kinetic theory, Beat frequency

Abstract

 Beat frequency and velocity variation of ions in a magnetized plasma sheath has been numerically investigated by using a kinetic trajectory simulation (KTS) model for varying obliqueness of the external magnetic field in presence of an electric field. Angular dependence of mean value, maximum amplitude, damping constant, frequency of oscillation and beat frequency have been studied. As the obliqueness of the field changes the mean values, beat frequency as well as the maximum amplitude of the velocity components also change but frequency of oscillation remains almost the same.

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Published

2019-01-01

How to Cite

Adhikari, B. R., Basnet, S., Lamichhane, H. P., & Khanal, R. (2019). BEAT FREQUENCY AND VELOCITY VARIATION OF IONS IN A MAGNETIZED PLASMA SHEATH FOR DIFFERENT OBLIQUENESS OF THE MAGNETIC FIELD. Journal of Institute of Science and Technology, 23(1), 88–92. https://doi.org/10.3126/jist.v23i1.22201

Issue

Vol. 23 No. 1 (2018)

Section

Research Articles

License

The views and interpretations in this journal are those of the author(s). They are not attributable to the Institute of Science and Technology, T.U. and do not imply the expression of any opinion concerning the legal status of any country, territory, city, area of its authorities, or concerning the delimitation of its frontiers of boundaries.

The copyright of the articles is held by the Institute of Science and Technology, T.U.